Thermal Evaporation System for 2" Wafer w/ 4 Sources & One Temperature Controller - GSL-1700X-EV4

Thermal Evaporation System for 2" Wafer w/ 4 Sources & One Temperature Controller - GSL-1700X-EV4
GSL-1700X-EV4 is a thermal evaporating system with a total of 4 evaporating sources and precision and programmable temperature control. Four evaporating crucibles could be used to deposit multiple different materials to grow multilayer films one by one in the same chamber atmosphere. The system is suitable for coating most of the film of the metallic and organic material up to 2" in size from 200 ºC to 1500 ºC (or 200 ºC - 1700 ºC with an optional B-type thermocouple).
Also, this device can be modified to coat 4" dia. wafer via a single crucible evaporating.
SPECIFICATIONS:
Standard Package
|
Item No.
|
Description
|
Pic | Quantity |
|
|
Quartz chamber 280 mm OD (ID = 260 mm, L = 310 mm) |
|
1
|
|
SPC2-ARSC |
Alumina outer crucible set (lid, thermal block, bottom crucible) |
1
|
|
| SPC2-AC |
Alumina cone-shaped crucible (OD = 19.6 mm, L = 24.0 mm)
|
4
|
|
| PGC-554-LD |
Anti-corrosive capacitance diaphragm gauge & controller with power supply, up to 3.8E-5 Torr
|
|
Optional
|
| SPC2-TB |
Tungsten coil heater, 1 mm wire diameter
|
|
2
|
| SPC2-Thermocouple-S |
S type thermocouple (included and installed) - heating from 200 ºC - 1500 ºC
|
|
1
|
|
B type thermocouple (at extra cost) - heating from 200 ºC - 1700 ºC
|
|
Optional
|
|
|
Tee flange for secure vacuum connection
|
|
1
|
Original: $53,998.00
-65%$53,998.00
$18,899.30Product Information
Product Information
Shipping & Returns
Shipping & Returns
Description
GSL-1700X-EV4 is a thermal evaporating system with a total of 4 evaporating sources and precision and programmable temperature control. Four evaporating crucibles could be used to deposit multiple different materials to grow multilayer films one by one in the same chamber atmosphere. The system is suitable for coating most of the film of the metallic and organic material up to 2" in size from 200 ºC to 1500 ºC (or 200 ºC - 1700 ºC with an optional B-type thermocouple).
Also, this device can be modified to coat 4" dia. wafer via a single crucible evaporating.
SPECIFICATIONS:
Standard Package
|
Item No.
|
Description
|
Pic | Quantity |
|
|
Quartz chamber 280 mm OD (ID = 260 mm, L = 310 mm) |
|
1
|
|
SPC2-ARSC |
Alumina outer crucible set (lid, thermal block, bottom crucible) |
1
|
|
| SPC2-AC |
Alumina cone-shaped crucible (OD = 19.6 mm, L = 24.0 mm)
|
4
|
|
| PGC-554-LD |
Anti-corrosive capacitance diaphragm gauge & controller with power supply, up to 3.8E-5 Torr
|
|
Optional
|
| SPC2-TB |
Tungsten coil heater, 1 mm wire diameter
|
|
2
|
| SPC2-Thermocouple-S |
S type thermocouple (included and installed) - heating from 200 ºC - 1500 ºC
|
|
1
|
|
B type thermocouple (at extra cost) - heating from 200 ºC - 1700 ºC
|
|
Optional
|
|
|
Tee flange for secure vacuum connection
|
|
1
|












