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Reflectance Spectrometer for Film Thickness Measurement from 15nm to 50 um - TFMS-LD

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Reflectance Spectrometer for Film Thickness Measurement from 15nm to 50 um - TFMS-LD

EQ-TFMS-LD is the thin film thickness measurement system that provides a quick and reliable solution for measuring the thickness of Translucent or Low Absorbing thin films from 15 nm to 50 um with 400 nm - 1100 nm spectral range. The measurement is based on specular reflectance and uses fiber optics reflectance probe. The compact system is easy to setup and user-friendly.

SPECIFICATIONS:
Features
  • Real time measurement and analysis: Multi-layer, thin, thick, freestanding and nonuniform layers
  • Extensive material library: 500+ materials
  • Support of parameterized materials: Cauchy, Tauc-Lorentz, Cody-Lorentz, EMA
  • Flexible: Desktop or in-situ, R&D or inline.
  • Measurement: Thickness, optical constants, surface roughness
  • User-friendly and powerful: One-click measurement and analysis
Majority of Translucent or Low Absorbing Films
  • Oxides (See Pic 1 for example)
  • Nitrides
  • Photoresists
  • Polymers (See Pic 2 for example)
  • Semiconductors: Si, aSi, polySi
  • Hard Coating: SiC, DLC
  • Polymer Coating: Paralene, PMMA, Polyamides
  • Thin Metal Coating (< 50 nm thickness. See Pic 3 for example)
    Pic 1 - 3 um LiNbO3 Pic 2 - 45 um PET Pic 3 - 20 nm Cu
Thickness Range
  • 15 nm - 75 um for non-metallic, translucent materials as listed above 
  • Note: metallic films can only be measured up to 50 nm reliably; X-Ray measurements are needed for thicker films
Spectral Range
  • 400 nm - 1100 nm
Precision
  • 0.01 nm or 0.01%
Accuracy
  • 0.2% or 1 nm
Stability
  • 0.02 nm or 0.03%
Spot Size
  • 2 mm minimum
Sample Size Requirement
  • Minimum 5 mm x 5 mm for reliable measurement
Spectrometer/Detector
  • 2048/4096 pixels CMOS
  • 16 bit ADC
  • 400 - 1100 nm wavelength range
  • Spectral resolution: < 1 nm
  • Power 100 -240 VAC, 50/60 Hz, 20 W power
Light Source
  • 5 W Tungsten-halogen lamp
  • CT 2800 degree
  • Lifetime: 10000 hours
Reflectance Probe
  • Fiberoptics, 400 um fiber core
  • with spectrometer leg and Illumination leg
Face-Up Measurement
  • The film sample faces up with probe and light source pointing down
Communication Interface and Laptop Computer
  • USB connector to communicate with PC
  • One brand new Laptop with software installed is included for immediate use
Software: TFCompanion 
  • Large library of refractive index (n) and extinction coefficient (k) values for the most common metallic, dielectric, amorphous and crystalline substrate materials
  • Capability for analyzing simple and the most complex film stacks
  • Error estimation and simulation tools allow for factoring in the effects of changing conditions
  • Support for parameterized materials with approximations representing optical dispersion in a desired spectral range using few coefficients that can be adjusted
Software Option
  • Remote control (TCP) based on Modbus protocol at extra cost
Measurement Standard (Included)
  • Bare Si Reference and 200 nm thick silicon oxide test wafer are included as thin-film standards for thickness measurement verification

Application Note
  • An example of metal thin film thickness measurement using the reflectance spectrometer can be downloaded here (Click Pic below)

 

 

$22,985.00
Reflectance Spectrometer for Film Thickness Measurement from 15nm to 50 um - TFMS-LD—
$22,985.00

Product Information

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Description

EQ-TFMS-LD is the thin film thickness measurement system that provides a quick and reliable solution for measuring the thickness of Translucent or Low Absorbing thin films from 15 nm to 50 um with 400 nm - 1100 nm spectral range. The measurement is based on specular reflectance and uses fiber optics reflectance probe. The compact system is easy to setup and user-friendly.

SPECIFICATIONS:
Features
  • Real time measurement and analysis: Multi-layer, thin, thick, freestanding and nonuniform layers
  • Extensive material library: 500+ materials
  • Support of parameterized materials: Cauchy, Tauc-Lorentz, Cody-Lorentz, EMA
  • Flexible: Desktop or in-situ, R&D or inline.
  • Measurement: Thickness, optical constants, surface roughness
  • User-friendly and powerful: One-click measurement and analysis
Majority of Translucent or Low Absorbing Films
  • Oxides (See Pic 1 for example)
  • Nitrides
  • Photoresists
  • Polymers (See Pic 2 for example)
  • Semiconductors: Si, aSi, polySi
  • Hard Coating: SiC, DLC
  • Polymer Coating: Paralene, PMMA, Polyamides
  • Thin Metal Coating (< 50 nm thickness. See Pic 3 for example)
    Pic 1 - 3 um LiNbO3 Pic 2 - 45 um PET Pic 3 - 20 nm Cu
Thickness Range
  • 15 nm - 75 um for non-metallic, translucent materials as listed above 
  • Note: metallic films can only be measured up to 50 nm reliably; X-Ray measurements are needed for thicker films
Spectral Range
  • 400 nm - 1100 nm
Precision
  • 0.01 nm or 0.01%
Accuracy
  • 0.2% or 1 nm
Stability
  • 0.02 nm or 0.03%
Spot Size
  • 2 mm minimum
Sample Size Requirement
  • Minimum 5 mm x 5 mm for reliable measurement
Spectrometer/Detector
  • 2048/4096 pixels CMOS
  • 16 bit ADC
  • 400 - 1100 nm wavelength range
  • Spectral resolution: < 1 nm
  • Power 100 -240 VAC, 50/60 Hz, 20 W power
Light Source
  • 5 W Tungsten-halogen lamp
  • CT 2800 degree
  • Lifetime: 10000 hours
Reflectance Probe
  • Fiberoptics, 400 um fiber core
  • with spectrometer leg and Illumination leg
Face-Up Measurement
  • The film sample faces up with probe and light source pointing down
Communication Interface and Laptop Computer
  • USB connector to communicate with PC
  • One brand new Laptop with software installed is included for immediate use
Software: TFCompanion 
  • Large library of refractive index (n) and extinction coefficient (k) values for the most common metallic, dielectric, amorphous and crystalline substrate materials
  • Capability for analyzing simple and the most complex film stacks
  • Error estimation and simulation tools allow for factoring in the effects of changing conditions
  • Support for parameterized materials with approximations representing optical dispersion in a desired spectral range using few coefficients that can be adjusted
Software Option
  • Remote control (TCP) based on Modbus protocol at extra cost
Measurement Standard (Included)
  • Bare Si Reference and 200 nm thick silicon oxide test wafer are included as thin-film standards for thickness measurement verification

Application Note
  • An example of metal thin film thickness measurement using the reflectance spectrometer can be downloaded here (Click Pic below)

 

 

Reflectance Spectrometer for Film Thickness Measurement from 15nm to 50 um - TFMS-LD | MTI Online Store