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1200C Tube Furnace with Internal Travel Mechanism For HPCVD - OTF-1200X-S-HPCVD
OTF-1200X-S-HPCVD is a compact 2" split tube furnace with an internal sample traveling system inside the processing tube. This allows the position & temperature control of the sample stage or crucible via touch screen digital controller. It is designed for multi-functional rapid thermal processing, such as hybrid physical-chemical deposition(HPCVD), rapid thermal evaporation (RTE), and as well Horizontal Bridgman Crystal Growth ( HDC) under various atmospheres for new-generation crystal research.
SPECIFICATIONS:
$6,995.10
Original: $19,986.00
-65%1200C Tube Furnace with Internal Travel Mechanism For HPCVD - OTF-1200X-S-HPCVD—
$19,986.00
$6,995.10Product Information
Product Information
Shipping & Returns
Shipping & Returns
Description
OTF-1200X-S-HPCVD is a compact 2" split tube furnace with an internal sample traveling system inside the processing tube. This allows the position & temperature control of the sample stage or crucible via touch screen digital controller. It is designed for multi-functional rapid thermal processing, such as hybrid physical-chemical deposition(HPCVD), rapid thermal evaporation (RTE), and as well Horizontal Bridgman Crystal Growth ( HDC) under various atmospheres for new-generation crystal research.
SPECIFICATIONS:
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Split Tube Furnace
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-- two-zone furnace |
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Temperature Control
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Vacuum Sealing
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(click the picture to see details ) |
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| Internal Traveling Mechanism & PLC Control Panel |
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| Max. Heating & Cooling Rate |
The max heating and cooling rate can be achieved by moving the sample into the pre-heated hot zone and moving the sample out from the hot zone. The typical ramp/cool rate is listed in below:
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Optional Parts |
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Compliance |
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| Application Notes |
This multi-functional furnace is suitable for the applications in below:
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