AlN Template on saphhire is made by a Plasma Vapor Deposition of NanoColumns (PVDNC)-based method. AlN template is a cost effective way to replace AlN single crystal substrate.

Specifications

Size	10mmx10mm
Substrate Sapphire Orientation	c axis (0001) +/- 1.0 deg.
Type and Doping for the AlN film	Undoped, Semi-insulating
Macro Defect Density	<5 cm-2
Front Surface Finish (Al Face)	As-grown
Back Surface Finish	Sapphire as-received finish
Useable Surface Area	>90%
Edge Exclusion Area	1mm
Package	Single Wafer Container
AlN layer thickness	1000 nm +/- 5%

• Surface Rughness and XRD data
• AlN MSDS