AlN  Template on saphhire is made by a Plasma Vapor Deposition of NanoColumns (PVDNC)-based method.  AlN template is a cost effective way to replace AlN single crystal substrate.

Specifications

• Sizes                                                       2” Round 
•  Dimensions:                                             50mm +/- 2mm
•  Substrate Sapphire Orientation:               c-axis (0001) +/- 1.0deg.
• Type and Doping:                                  Undoped, Semi-insulating
• Macro Defect Density:                                <5 cm^-2
• Front Surface Finish (Al Face):                     As-grown
  
• Back Surface Finish Sapphire                       as-received finish
•  Useable Surface Area                                >90% 
•  Edge Exclusion Area                                  1mm
•   Package                                                  Single Wafer Container
• AlN layer thickness                                      5000 nm  , (¡À 10%) 

•   AlN MSDS
•  

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