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AlN Template on Sapphire(0001) 2"x 0.5mm, two sides polished, AlN film: 1000nm

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AlN Template on Sapphire(0001) 2"x 0.5mm, two sides polished, AlN film: 1000nm

AlN  Template on saphhire is made by a Plasma Vapor Deposition of NanoColumns (PVDNC)-based method.  AlN template is a cost effective way to replace AlN single crystal substrate.

Specifications

  • Sizes:                                                    2" round
  •  Substrate Sapphire Orientation:               C plane 0.20° offcut towards m-plane
  • Type and Doping  for the AlN film             Undoped
  • Macro Defect Density:                             <5 cm-2
  • Front Surface Finish (Al Face):                 As-grown
  • Back Surface Finish Sapphire:                  as-received finish
  • Useable Surface Area:                              >90% 
  • Edge Exclusion Area:                               1mm
  • Package:                                                 Single Wafer Container
  • AlN layer thickness:                                 1000 nm +/- 5%
  • Polish:                                                     Both sides polished

 

 

 

 Related data

For Surface Rughness and XRD data, Please click here.
  •   AlN MSDS

     

 

Related Products

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Plasma Cleaner

Wafer Containers

Dicing saw

Film Coater

$1,190.00
AlN Template on Sapphire(0001) 2"x 0.5mm, two sides polished, AlN film: 1000nm
$1,190.00

Product Information

Shipping & Returns

Description

AlN  Template on saphhire is made by a Plasma Vapor Deposition of NanoColumns (PVDNC)-based method.  AlN template is a cost effective way to replace AlN single crystal substrate.

Specifications

  • Sizes:                                                    2" round
  •  Substrate Sapphire Orientation:               C plane 0.20° offcut towards m-plane
  • Type and Doping  for the AlN film             Undoped
  • Macro Defect Density:                             <5 cm-2
  • Front Surface Finish (Al Face):                 As-grown
  • Back Surface Finish Sapphire:                  as-received finish
  • Useable Surface Area:                              >90% 
  • Edge Exclusion Area:                               1mm
  • Package:                                                 Single Wafer Container
  • AlN layer thickness:                                 1000 nm +/- 5%
  • Polish:                                                     Both sides polished

 

 

 

 Related data

For Surface Rughness and XRD data, Please click here.
  •   AlN MSDS

     

 

Related Products

Thin Films  A-Z

Crystal wafer A-Z

Plasma Cleaner

Wafer Containers

Dicing saw

Film Coater

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