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Compact Liquid Vaporization Systems with Temperature and Pressure Control for CVD & DLCVD - LVD-F1

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Compact Liquid Vaporization Systems with Temperature and Pressure Control for CVD & DLCVD - LVD-F1

LVD-F1 is a precision & cost-effective liquid evaporating delivery system for lab scale CVD or DLCVD, which can carry all types of liquids, such as ETOH, SnCl4, TiCl4r, SiHCl3, and Zn(C2H5)2, etc., without worrying about corrosion. It is an ideal tool for the CVD processing of nanowire and film in material research.

 

SPECIFICATIONS

Product Structure
Power Input
  • 220V 50Hz
  • 2200 W Power consumption
  • 110V is available with a transformer

Liquid Flow Control
  • Flow rate range: 1 - 82 ± 1ml/minute adjustable (min. rate: 1 ml/min)
Heater & Temperature controller
  • SS316 evaporating chamber, up to 550ºC
  • Heating gas line, up to 200ºC) to prevent liquid condensation.
  • Single point temperature controller for the evaporator and heating line. 
Gas flow control
  • Carrying gas (inert gas) is controlled by a precision float flow-meter (200 - 2000 mL/min adjustable). The optional digital mass flow controller is available at extra cost.
  • Pressure gauge built in front panel
  • Two SS needle valves are installed to control gas in and out
  • Vapor Gas outlet tube fitting size: 1/4"OD
  • Note: 1/4'' PTFE tube, 1/4'' SS tube, and beaker are not included, customers need to prepare them according to the experimental needs.
  • The inert gas tank is required to deliver vapor 
Application Note
  • This system can fit with all MTI tube furnaces and CVD furnaces, click the picture below to see how, and choose a furnace at " CVD Furnace System" 
Compliance
  • CE Certified
  • NRTL or CSA certification is available upon request

 

$2,799.30

Original: $7,998.00

-65%
Compact Liquid Vaporization Systems with Temperature and Pressure Control for CVD & DLCVD - LVD-F1—

$7,998.00

$2,799.30

Product Information

Shipping & Returns

Description

LVD-F1 is a precision & cost-effective liquid evaporating delivery system for lab scale CVD or DLCVD, which can carry all types of liquids, such as ETOH, SnCl4, TiCl4r, SiHCl3, and Zn(C2H5)2, etc., without worrying about corrosion. It is an ideal tool for the CVD processing of nanowire and film in material research.

 

SPECIFICATIONS

Product Structure
Power Input
  • 220V 50Hz
  • 2200 W Power consumption
  • 110V is available with a transformer

Liquid Flow Control
  • Flow rate range: 1 - 82 ± 1ml/minute adjustable (min. rate: 1 ml/min)
Heater & Temperature controller
  • SS316 evaporating chamber, up to 550ºC
  • Heating gas line, up to 200ºC) to prevent liquid condensation.
  • Single point temperature controller for the evaporator and heating line. 
Gas flow control
  • Carrying gas (inert gas) is controlled by a precision float flow-meter (200 - 2000 mL/min adjustable). The optional digital mass flow controller is available at extra cost.
  • Pressure gauge built in front panel
  • Two SS needle valves are installed to control gas in and out
  • Vapor Gas outlet tube fitting size: 1/4"OD
  • Note: 1/4'' PTFE tube, 1/4'' SS tube, and beaker are not included, customers need to prepare them according to the experimental needs.
  • The inert gas tank is required to deliver vapor 
Application Note
  • This system can fit with all MTI tube furnaces and CVD furnaces, click the picture below to see how, and choose a furnace at " CVD Furnace System" 
Compliance
  • CE Certified
  • NRTL or CSA certification is available upon request

 

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